zhzn1995 / lithography-gdsii-format-generator

Lithography GDSII format generator

This program is meant to generate pillar and grid structures for being used in photo-lithography process. It allows the user to use different sizes of (100)Si wafers. Wafers can be subdivided into different sections that will allow the creation of different patterns within the same wafer. The final result is a 3 layer .gds file where the first layer is the wafer, the second layer is working area (determined by a chosen margin) and the third layer is where the generated structures are.

Getting Started

These instructions will get you a copy of the project up and running on your local machine for development and testing purposes. See deployment for notes on how to deploy the project on a live system.

Prerequisites

In order to use this program you need:

• numpy (v1.11.0)
• gdspy (v1.1.2)

If using Windows install Anaconda from https://www.continuum.io/downloads and all these commands should be executed using Anaconda Prompt application.

Installing numpy (usually comes with python anaconda):

pip install numpy==1.11.0 

Installing gdspy:

If using windows you need Microsoft Visual C++ 9.0. You can get it from http://aka.ms/vcpython27

pip install gdspy==1.1.2

If it gives you some writing error you might want to execute these commands as sudo

Installing

Clone the repository:

git clone https://github.com/mgarc729/lithography-GDSII-format-generator.git

Install the prerequisites and execute:

python gui.py

Contributing

Please read CONTRIBUTING.md for details on our code of conduct, and the process for submitting pull requests to us.

Versioning

We use SemVer. Stable version 1.1.0

Authors

• Manuel Garcia - Initial work - mgarc792

License

This project is licensed under the MIT License - see the LICENSE.md file for details

Acknowledgments

• Kyle Wilke, Mechanical Engineering Department at MIT for his advice.