- The four designs testcase1, testcase2, testcase3 and testcase4 are originally from ICCAD 2016 CAD Contest Problem C
- Designs are shrinked to 16nm CD to match N7 EUV specific metal layer design
- Defect (Hotspot) information is in csv files with coordinates (dbu) in the corresponding layouts
- There might be redundant records of hotspots in csv files. The simulation is set with a certain process window and hotspot might occur at the same location under different process conditions (dose, focus).
- Simulation is on EUV lithography model considering mask 3D effect.
- Hotspot information is obtained with the following OPC->Child Models for Process Window->PV Band Simulation
- Only EPE, Bridging and Necking defects are considered and recorded.
- ICCAD2016Contest
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Ran Chen, Wei Zhong, Haoyu Yang, Hao Geng, Xuan Zeng, Bei Yu, "Faster Region-based Hotspot Detection", ACM/IEEE Design Automation Conference (DAC), Las Vegas, NV, June 2โ6, 2019.
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Haoyu Yang, Shuhe Li, Cyrus Tabery, Bingqing Lin and Bei Yu, "Bridging the Gap Between Layout Pattern Sampling and Hotspot Detection via Batch Active Learning", IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD). Early Access